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AS ISO 17560-2006

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AS ISO 17560-2006 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon

standard by Standards Australia, 01/01/2006

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Adopts ISO 17560:2002 to specify a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon and using stylus profilometry or optical interferometry for depth scale calibration.

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Published: 01/01/2006File Size: 1 file , 420 KB